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05. ÇüÁ¦ Áø°ø ¼³¸³ |
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11. UO2 Plasma Etcher
System °³¹ß (MODEL : UPES-01) |
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05. '96 »ê, ÇÐ, ¿¬ °øµ¿
±â¼ú°³¹ß Âü¿© ¼öÇà |
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06. R.T.A System
°³¹ß |
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11. PE CVD °³¹ß |
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12. '96 »ê, ÇÐ, ¿¬ °øµ¿±â¼ú
°³¹ß¿Ï·á [°úÁ¦¸í : MO(GaN)CVD Àåºñ] |
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02. ¢ßÇüÁ¦Áø°øÀ¸·Î »óÈ£ º¯°æ
¹× ¹ýÀÎ ¼³¸³ |
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12. '97 ¿ì¼ö Áß¼Ò±â¾÷ ´ë»ó
¼±Á¤(°í¾ç½Ã) |
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05. Çü½Ä½ÂÀÎ ¹øÈ£ Ãëµæ(heat
pipe heater) |
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10. heat Pipe Heater
°³¹ß ¹× »óÇ°È |
| |
11. 'Q' ¸¶Å© Ãëµæ(heat
pipe heater) |
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11. º´¿ªÆ¯·Ê¾÷ü ÁöÁ¤ |
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12. °æ±âµµ ÆÄÁֽ÷ΠÀÚ»ç ÀÌÀü |
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12. CLEAN ROOM(CLASS
100) Áذø (°æ±âµµ ÆÄÁÖ) |
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02. ¢ßÇüÁ¦Áø°ø¿¡¼ ¢ß¼¿ïº£Å¨Å×Å©·Î
»óÈ£ º¯°æ |
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05. °ø¾÷±â¹Ý±â¼ú°³¹ß»ç¾÷ ¼±Á¤(»êÀÚºÎ)
[°úÁ¦¸í : Wafer lever Áø°ø Packing] |
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04. °ø¾÷ ±â¹Ý ±â¼ú °³¹ß »ç¾÷
1Â÷³âµµ ¿Ï·á
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°úÁ¦¸í : Wafer lever Áø°ø Packaging °øÁ¤/TOOL ±â¼ú
°³¹ß |
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SOI(silicon on insulater) WAFER ¾ç»ê °èȹ ¼ö¸³ |
| |
05. °ø¾÷±â¹Ý ±â¼ú °³¹ß»ç¾÷(»ê¾÷ÀÚ¿øºÎ) 2Â÷³âµµ ½ÃÀÛ |
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°úÁ¦¹° : Wafer lever Áø°ø Packaging °øÁ¤/TOOL ±â¼ú °³¹ß |
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¹ß¸íƯÇãµî·Ï (ƯÇã Á¦0359029) |
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¹ß¸í¸íĪ : À§ÆÛ Á¢ÇÕÀåÄ¡ÀÇ ½ºÆäÀ̼ À̵¿¿ë ½½¶óÀ̵å ÀåÄ¡ |
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07. Cold Cathede Full Automatic Pumping&Bombarding System °³¹ß |
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07. 2002 ºÎ»ê»çÀÎ µðÀÚÀÎÀü(Bexco) Cold Cathede Pumping System Ãâǰ |
| |
12. CCFL °³¹ß ÆÀ ½Å¼³ |
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±¹¹ÎÀºÇà(KB *b), KT&G µî Lamp Á¦ÀÛ ³³Ç° |
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08. »ï¼ºÈÀç ¿ÜºÎ Sign Àû¿ë Cold Cathode Lamp Àü±¹ ¹°·® ³³Ç°
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11. ÀÚü °³¹ß Cold Cathode ¿ë ÀüÀÚ½Ä Transformer °³¹ß
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Kosign 2003 Çѱ¹ »çÀΕµðÀÚÀÎÀü Âü°¡ |
| 12. ¸ñµ¿ SBS ½ÅÃà »ç¿Á ¿ÜºÎ Sign Cold Cathode Lamp ³³Ç°
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02. Vacuum Dry Oven °³¹ß |
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11. TiO2 Coating CVD System °³¹ß |
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08. Hot Plate °³¹ß(1000*1500) |
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05. HP/CP Glass Loading System °³¹ß |
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11. Hot Plate 1Â÷ ÇöÀå Áõ¼³ (ÄÚ¸ä³×Æ®¿öÅ©) |
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04. Hot Plate ´ë¸¸¼öÃâ |
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06. ÀÚü ¾ç»ê¿ë TiO2 CVD System °³¹ß |
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08. CVD System ³³Ç° (ÈÇבּ¸¼Ò) |
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07. Äݵå¹è±â½Ã½ºÅÛ 1Â÷ Áß±¹¼öÃâ |
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11. Äݵå¹è±â½Ã½ºÅÛ 2Â÷ Áß±¹¼öÃâ |
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12. Hot Plate 2Â÷ ÇöÀå Áõ¼³ (ÄÚ¸ä³×Æ®¿öÅ©) |
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05. Hot Plate 1Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî) |
| |
06. R.T.B System ¸»·¹ÀÌ½Ã¾Æ ¼öÃâ |
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11. R.T.B System µ¶ÀÏ ¼öÃâ |
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01. Hot Plate 2Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî) |
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02. Hot Plate 3Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî) |
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08. R.T.B System Áß±¹, ÀϺ» ¼öÃâ |
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11. Á¦ÀÌ¿¡½º¾ØÈÄÁöºñ¾¾¿Í ´ÙÀ̾Ƹóµå ÄÚÆÃ¿ë PACVD System ÇÕÀÛ°³¹ß |
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04. R.T.B System ´ë¸¸, ű¹ ¼öÃâ |
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10. Vacuum Dry Oven ¾÷±×·¹ÀÌµå °³¹ß |
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05. R.T.B System ÀϺ» ¼öÃâ |
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